Jim Doyle’s research straddles the boundary between chemistry and physics with an emphasis on chemical and physical processes that occur in plasma-assisted deposition of materials. He has also worked extensively on “hot-wire” chemical vapor deposition of hydrogenated amorphous silicon. Much of his work has focused on materials used in thin film photovoltaics (solar cells). Research areas include physio-chemical kinetics of silane, germane, methane, acetylene, and hydrogen glow discharge plasmas using mass spectrometry, deposition of zinc oxide and germanium thin films by magnetron sputtering, plasma characterization by probes and optical emission spectroscopy, solution and electrodeposition of photo-electronic materials, hot-wire deposition of silicon and silicon-germanium alloys, and computer modeling of plasmas and atom transport. Jim has recently begun working on the modeling of grid energy balance with storage, and is also exploring new potential research topics in biophysics. His research is primarily experimental but also has a strong computational component.
See Curriculum Vitae for more details and publications.